WebDisclosed are a method of forming an optical proximity correction (OPC) model and/or a method of fabricating a semiconductor device using the same. The method of forming the OPC model may include obtaining a scanning electron microscope (SEM) image, which is an average image of a plurality of images taken using one or more scanning electron … WebApr 27, 2016 · A lithographic mask manufacturability and pattern fidelity aware OPC algorithm Abstract: Optical Proximity Correction (OPC) is still the main stream among Resolution Enhancement Techniques (RETs) for printing advanced technology nodes in optical lithography in the foreseeable future.
Ashutosh Rathi , Ph.D. - EDA Tools Software Engineer - Intel
WebMar 1, 2009 · In this work, we have proposed an intelligent optical proximity correction technique for process distortion compensation of layout mask. It combines the genetic algorithm, the model- and rule-based technique, and the lithography numerical simulation to perform the mask correction in sub-wavelength era. flir scion otm236 review
Optical proximity correction by using unsupervised learning and …
Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen mainly in the making of semiconductor devices and is due to the limitations of light to maintain the edge placement … See more The degree of coherence of the illumination source is determined by the ratio of its angular extent to the numerical aperture. This ratio is often called the partial coherence factor, or $${\displaystyle \sigma }$$. … See more As the $${\displaystyle k_{1}}$$ factor has been steadily shrinking over the past technology generations, the anticipated requirement of moving to multiple exposure to … See more Today, OPC is rarely practiced without the use of commercial packages from electronic design automation (EDA) vendors. Advances in algorithms, modeling … See more • Overview of OPC, with diagrams, by Frank Gennari See more Aberrations in optical projection systems deform wavefronts, or the spectrum or spread of illumination angles, which can affect the depth of focus. While the use of OPC can offer … See more In contrast to multiple exposure of the same photoresist film, multiple layer patterning entails repeated photoresist coating, deposition, and etching to pattern the same device layer. This gives an opportunity to use looser design rules to pattern the same … See more • Computational lithography • Phase-shift mask • Inverse lithography See more WebMar 1, 2009 · Optical proximity correction (OPC) is the process of modifying the geometries of the layouts to compensate for the non-ideal properties of the lithography process. … WebOptical Proximity Correction (OPC) OPC is a technique used to compensate for image distortions that occur during sub-wavelength lithography: printing structures smaller than … great falls vet clinic